- Заглавие:
Experimental study and computer simulation of aspect ratio dependent effeсts observed in silicon reactive ion etching
- Язык текста:
Английский
- Сведения об источнике:
Microelectronic Engineering. – 1996. – Vol. 30, № 1/4. – P. 345–348.
Библиографический источник
Experimental study and computer simulation of aspect ratio dependent effeсts observed in...
V. F. Lukichev, K. V. Rudenko, D. Fischer [et al.]